Overview
The LIX-2 series delivers nanometer-resolution thermal expansion measurement via dual-path Michelson laser interferometry, with dual-temperature configurations for films, precision ceramics, and calibration applications.
The LIX-2 laser interferometer is designed for high-accuracy thermal expansion measurement with 1 nm reading resolution. It employs dual-path Michelson laser interferometry for precise displacement detection and is available in two temperature-optimized models to support a range of materials and environments.
The system is particularly well suited for measuring thin films, organic coatings, and low-expansion materials where conventional dilatometry may lack the necessary resolution. Its compact optical design and patent-protected parallel-shifting sample holder enable stable, repeatable measurements across a temperature range from −150 to +700°C depending on model selection.
The LIX-2 series complies with JIS R3251-1995 and is suitable both for absolute thermal expansion measurement of unknown samples and as a calibration reference for standard thermal dilatometers.
Key Features
- 1 nm reading resolution via dual-path Michelson laser interferometry
- Parallel-shifting sample holder design for stable, repeatable measurement (patented)
- High-accuracy measurements suitable for thin films (50−500 µm thickness in thickness direction when using quartz sample)
- Two temperature ranges to match application needs: −150 to +200°C (LIX-2L) or RT to +700°C (LIX-2M)
- Vacuum or low-pressure high-purity helium atmosphere options
- Suitable for calibration of standard thermal dilatometers
- Precision measurement of low-expansion glass, metals, and ceramics
Typical Applications
- Measurement of organic films in the thickness direction
- Precise measurement of low-expansion glass materials
- Quality control of low-expansion metal materials
- Seal material thermal behavior assessment
- Precise measurement of electronic device components and parts
- Calibration samples for standard thermal dilatometer systems
LIX-2M and LIX-2L Models
- LIX-2M: Room temperature to 700°C — optimized for high-temperature ceramic, glass, and metal characterization
- LIX-2L: −150 to +200°C — designed for low-temperature films, polymers, and seal materials
Specifications
| Parameter | LIX-2M | LIX-2L |
|---|---|---|
| Temperature Range | RT to 700°C | -150 to +200°C |
| Sample Size | φ5 to 6 × L10 to 15 mm (both end faces finished spherically) | |
| Atmosphere | Vacuum or low-pressure high-purity helium gas | |
| Measurement Method | Dual-path Michelson laser interferometry | |
| Reading Resolution | 1 nm | |
Standards and Patents
- Compliant with JIS R3251-1995 (Linear thermal expansion coefficient measurement for low-expansion glass by laser interferometry)
- Patent: Parallel-shifting sample holder design