Ultra-High-Resolution Expansion Metrology
Quantify minute thermal expansion in precision materials
Laser interferometry is selected when conventional expansion methods cannot provide sufficient resolution. By tracking displacement optically at nanometer scale, it supports highly accurate CTE characterization for advanced ceramics, low-expansion glass, engineered alloys, thin films, and reference materials.
This method is especially important in semiconductor, aerospace, optics, and precision engineering contexts where tiny dimensional changes can drive large performance effects. To achieve robust results, thermal control, sample conditioning, and calibration quality are critical. In return, LI offers the precision needed to distinguish subtle material differences, qualify reference standards, and support development of dimensionally stable high-performance systems.
SuperLIX
Ultra-high-precision laser Interferometer resolving thermal expansion coefficients down to 1×10⁻⁸/K.
LIX-2 series
Laser interferometer for high-accuracy thermal expansion measurements of low-expansion materials, films and calibration standards with 1 nm reading resolution.