Products Thermal Expansion Product

SuperLIX

The SuperLIX is an ultra-high-precision laser interferometer capable of resolving thermal expansion coefficients down to 1×10⁻⁸/K. It is the definitive instrument for zero- and negative-expansion materials, semiconductor lithography components and other applications demanding world-class measurement accuracy.

Overview

SuperLIX is an ultra-high-precision laser interferometric thermal expansion system designed for materials where even minute dimensional changes matter. It enables reliable expansion analysis down to the 10⁻⁸/K level for advanced R&D and high-accuracy quality control.

SuperLIX is built for thermal expansion measurement of ultra-low-expansion materials, using a dual-path Michelson laser interferometry approach for very high displacement resolution. The system targets applications where conventional dilatometry is often not sufficient, including precision ceramics, specialty metals, and components used in high-accuracy manufacturing systems.

By combining optical displacement measurement, vibration-disturbance suppression, and stable thermal control, SuperLIX supports repeatable measurements in demanding environments. The platform is especially suitable for development and qualification of zero-expansion and negative-expansion material systems.

Key Features

Ultra-high-accuracy thermal expansion analysis at the 10⁻⁸/K level (application-dependent)
Dual-path Michelson laser interferometry using 632.8 nm wavelength reference
Integrated vibration-elimination mechanism for stable operation with standard high-resolution analytical balance environments
Optical design that suppresses stray light and improves fringe signal S/N
Image-sensor fringe detection with image processing for high-resolution expansion/contraction tracking during measurement
No special displacement calibration procedure required for routine operation
Reduced-pressure helium atmosphere for controlled measurement conditions

Typical Application Cases

Development of zero-expansion materials
Development of negative thermal expansion materials and advanced anode materials
Development and verification of reference/standard materials
Material development for actuator systems

Typical End-Use Applications

High-precision dilatometry of extremely low-expansion materials (glass, ceramics, metals)
Parts for semiconductor lithography systems
Precision stage components
Aerospace-grade materials requiring strict dimensional accuracy
High-precision photogrammetry substrate materials
Quality control of low-expansion materials

Measurement Examples

Low-expansion ceramics
Super-Invar and other low-expansion metals

Specifications

Parameter	SuperLIX-R
Temperature Range	Standard type 5 to 50°C (with high-accuracy water circulation system)
Sample Size	Φ5 or □5 ± 0.5 × L20 mm (standard: Φ5 × L20 mm, end-face R-shape finish)
Atmosphere	Reduced-pressure He atmosphere
Measurement Method	Dual-path Michelson laser interferometry

Utility Requirements

Item	Requirement
Space Requirement	Approx. W1200 × D760 × H1600 mm (minimum 2500 mm height required for chamber removal)
Power	PC: AC100V 15A (2 locations); Exhaust: AC200V 3-phase 15A (1); Gas feed: AC100V 1-phase 15A (1); Water circulation: AC100V 15A (1)
Grounding	D type (ground resistance 100Ω or below), one location

Patents and Standards

Compliant with JIS R3251-1990
Related special features/patent applications: 2016-058190, 2016-058191, 2016-058192